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Our Bureau

New Delhi , June 1

THE industrial synthetics and refrigerant gases major SRF Ltd has been granted a process patent by the US Patent and Trademark Office for production of difluoromethane.

Difluoromethane is an ozone-friendly refrigerant to be used as a component in blends that are replacing hydro chloro-fluoro carbons such as HCFC-22, which are being gradually phased out across the world, a company release said.

"Global demand for the product is strong and is likely to increase three-fold by 2010. The patent therefore presents the company with a large and attractive opportunity in a rapidly expanding global market," the release said.

It said several global majors in refrigerants do not have plans to manufacture HFC-32 and will outsource their requirements, resulting in a business opportunity for SRF.

The patented process has been developed in-house by the SRF research and development team, the release said.

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